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A Brief Review of U.S. and Korean Patent Invalidity Decisions for CMP Slurry Patents

  • 09.01.11
  • Patrick P. Hansen and Donald J. Featherstone
  • Nanotechnology Law & Business

Few nanotechnology patents have been tested in court, either in the United States or abroad. This article reviews the treatment of Chemical Mechanical Planarization (CMP) slurry patents asserted in U.S. and Korean courts. While a jury in a U.S. District Court found Cabot Microelectronics Corporation's patents not to be invalid, Korean Courts found Cabot's CMP Korean patent to be invalid. Invalidity trends in the U.S. and Korea are also discussed. Download the PDF above to access the full article.

Patrick P. Hansen & Donald J. Featherstone, "A Brief Review of U.S. and Korean Patent Invalidity Decisions for CMP Slurry Patents," Issue 8.2, Nanotechnology Law & Business (2011), is reprinted with permission of Nanotechnology Law & Business, www.nanolabweb.com. Copyright (c) 2011. All rights reserved."

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